Minsk Research Institute of Radiomaterials of the National Academy of Sciences of Belarus offers consumers lithographic photomasks under a manufacturing agreement.

Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon).

OJSC "Minsk Research Institute of Radiomaterials" of the National Academy of Sciences of Belarus manufactures precision photomasks on glass (K8) or quartz substrates, designed for projection photolithography in the production of integrated circuits, thin-film, microstrip and microwave boards, semiconductor devices for various purposes, etc.

Manufacturing process of photomasks uses photoresists, with the area of maximum sensitivity near UV radiation. The pattern is formed by focused laser with a wavelength of 355 nm.

Precision photomasks are manufactured using modern equipment (multichannel laser image generator EM-5189-02), have high accuracy of the neometric dimensions of the drawing elements and the step between fragments, stability of the drawing and its dimensions over time, high image contrast.

Photomasks are characterized by:
* high resolution;
* a large number of identical images;
* high optical density of opaque areas;
* high quality of the drawing surface;
* uniformity of the pattern;
* abrasion resistance;
* flatness of the working side.

Types of photomasks produced:
* with iron oxide masking coating;
* with chrome masking coating.

Technical specifications:

minimum element size	0,6 µm
thickness	2,2..6,4 mm
overall dimensions of the workpieces	127 mm (5"),152 mm (6") and 178 mm (7")
unevenness of the edge of the element	not more than 0,3 microns
rounding the corner of an element	not more than 0,5 microns
the error of joining the strips	not more than ±40 nm
the error of the connection	not more than ±70 nm

Areas of use: optics, optoelectronics, laser technology and microelectronics.

Import substitution for photomasks produced by Zelenograd Nanotechnology Center JSC, NPK Ferrit-Kvazar, NPK Avangard JSC, NPP Radar MMS (Russia), Xiamen Powerway Advanced Material Co., Ltd (China), Photronics , Inc. (USA), Compugraphics International Ltd. (Great Britain).

The specialization of the institute includes the following main areas:
* development and production of the element base and functional units of microwave technology (solid-state microwave monolithic integrated circuits - low-noise amplifiers and power amplifiers, protective devices, switches, attenuators, frequency converters; microwave modules, etc.);
* development and production of optoelectronic components and modules based on them (photodetectors, light emitting diodes, semiconductor lasers, receiving and transmitting optical modules);
* production of materials for semiconductor production - gallium arsenide substrates of the "epi-ready" standard;
* development of sensor technology, modules and systems (sensors for inclination, pressure, acceleration, electronic compass, etc.);
* development and production of medical equipment.

The research and production base of the institute includes dedicated equipment which allows to develop and perform a full cycle of technological operations for the manufacture of microwaves, optoelectronic components, sensors of physical quantities based on microelectromechanical systems, equipment for the manufacture of medical products - Glucosen sensors etc. In particular, the equipment allows cutting semiconductor ingots of A3B5 compounds (GaAs, InP, GaN, etc.), grinding and polishing wafers, epitaxial growth, thermal diffusion and implantation of dopants, microcircuit packaging, control of their parameters, etc.

The Institute has a licensed software for electrodynamic calculations, its own library of standard elements, methods for monitoring and testing microwave components in the C, S, L, X, K wavelength ranges, electronic lithography equipment with a resolution of 100 nm, which provides a modern level of design standards.

As part of the specialization, the development of technologies, components and devices for various radio-electronic systems is carried out: radar systems, fiber-optic communication lines, laser rangefinders, systems for leveling and orientation of objects, control systems, guidance and navigation, etc.

Consumers interested in purchasing photomasks under a manufacturing agreement.